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- W1996282004 abstract "Resistance measurements in zero magnetic field have been made on thin Cu films (30 to 500 AA{}) between 1 to 100 K with the goal of determining the relevant scattering times. The elastic scattering time ${ensuremath{tau}}_{0}$ is limited by the thickness $d$ of the samples and is well described by ${ensuremath{tau}}_{0}=frac{{v}_{F}}{d}$. With the assumption that the inelastic scattering time ${ensuremath{tau}}_{i}$ has a temperature dependence given by ${ensuremath{tau}}_{i}ensuremath{propto}{T}^{ensuremath{-}P}$, then the high-temperature resistance data yielded $P=1.9ifmmodepmelsetextpmfi{}0.3$. These measurements also demonstrate that the localization phenomena extend to temperatures much greater than the temperature ${T}_{min}$ at which the resistance minimum occurs. At low temperatures in the thinnest films, deviations in the resistance from the logarithmic temperature dependence are observed; this effect is attributed to strong spin-orbit scattering which dominates the inelastic scattering at low temperatures (${ensuremath{tau}}_{mathrm{so}}<~{ensuremath{tau}}_{i}$)." @default.
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- W1996282004 date "1983-01-15" @default.
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- W1996282004 title "Localization in thin copper films" @default.
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- W1996282004 doi "https://doi.org/10.1103/physrevb.27.1409" @default.
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