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• W1996457344 endingPage "261501" @default.
• W1996457344 startingPage "261501" @default.
• W1996457344 abstract "Roughening of nanoscale polymer masks during plasma etching (PE) limits feature critical dimensions in current and future lithographic technologies. Roughness formation of 193 nm photoresist (PR) is mechanistically explained by plasma-induced changes in mechanical properties introduced at the PR surface (∼2 nm) by ions and in parallel in the material bulk (∼200 nm) by ultraviolet (UV) plasma radiation. Synergistic roughening of polymer masks can be prevented by pretreating PR patterns with a high dose of He plasma UV exposure to saturate bulk material modifications. During subsequent PE, PR patterns are stabilized and exhibit improved etch resistance and reduced surface/line-edge roughness." @default.
• W1996457344 created "2016-06-24" @default.
• W1996457344 creator A5002965727 @default.
• W1996457344 creator A5024630942 @default.
• W1996457344 creator A5033304343 @default.
• W1996457344 creator A5064598334 @default.
• W1996457344 creator A5079707423 @default.
• W1996457344 creator A5088251109 @default.
• W1996457344 creator A5089034106 @default.
• W1996457344 date "2011-12-26" @default.
• W1996457344 modified "2023-09-28" @default.
• W1996457344 title "Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity" @default.
• W1996457344 cites W1978694105 @default.
• W1996457344 cites W1988706967 @default.
• W1996457344 cites W2000005333 @default.
• W1996457344 cites W2009732332 @default.
• W1996457344 cites W2015168690 @default.
• W1996457344 cites W2029727970 @default.
• W1996457344 cites W2032821943 @default.
• W1996457344 cites W2058058059 @default.
• W1996457344 cites W2063972279 @default.
• W1996457344 cites W2066806195 @default.
• W1996457344 cites W2081244818 @default.
• W1996457344 cites W2145930691 @default.
• W1996457344 cites W4255666896 @default.
• W1996457344 doi "https://doi.org/10.1063/1.3671995" @default.
• W1996457344 hasPublicationYear "2011" @default.
• W1996457344 type Work @default.
• W1996457344 sameAs 1996457344 @default.
• W1996457344 citedByCount "10" @default.
• W1996457344 countsByYear W19964573442013 @default.
• W1996457344 countsByYear W19964573442014 @default.
• W1996457344 countsByYear W19964573442015 @default.
• W1996457344 countsByYear W19964573442016 @default.
• W1996457344 countsByYear W19964573442017 @default.
• W1996457344 countsByYear W19964573442018 @default.
• W1996457344 countsByYear W19964573442020 @default.
• W1996457344 countsByYear W19964573442021 @default.
• W1996457344 crossrefType "journal-article" @default.
• W1996457344 hasAuthorship W1996457344A5002965727 @default.
• W1996457344 hasAuthorship W1996457344A5024630942 @default.
• W1996457344 hasAuthorship W1996457344A5033304343 @default.
• W1996457344 hasAuthorship W1996457344A5064598334 @default.
• W1996457344 hasAuthorship W1996457344A5079707423 @default.
• W1996457344 hasAuthorship W1996457344A5088251109 @default.
• W1996457344 hasAuthorship W1996457344A5089034106 @default.
• W1996457344 hasConcept C100460472 @default.
• W1996457344 hasConcept C107187091 @default.
• W1996457344 hasConcept C107365816 @default.
• W1996457344 hasConcept C111337013 @default.
• W1996457344 hasConcept C121332964 @default.
• W1996457344 hasConcept C134406635 @default.
• W1996457344 hasConcept C159985019 @default.
• W1996457344 hasConcept C171250308 @default.
• W1996457344 hasConcept C185544564 @default.
• W1996457344 hasConcept C192562407 @default.
• W1996457344 hasConcept C204223013 @default.
• W1996457344 hasConcept C2776798109 @default.
• W1996457344 hasConcept C2779227376 @default.
• W1996457344 hasConcept C45206210 @default.
• W1996457344 hasConcept C49040817 @default.
• W1996457344 hasConcept C521977710 @default.
• W1996457344 hasConcept C53524968 @default.
• W1996457344 hasConcept C62520636 @default.
• W1996457344 hasConcept C71039073 @default.
• W1996457344 hasConcept C82706917 @default.
• W1996457344 hasConceptScore W1996457344C100460472 @default.
• W1996457344 hasConceptScore W1996457344C107187091 @default.
• W1996457344 hasConceptScore W1996457344C107365816 @default.
• W1996457344 hasConceptScore W1996457344C111337013 @default.
• W1996457344 hasConceptScore W1996457344C121332964 @default.
• W1996457344 hasConceptScore W1996457344C134406635 @default.
• W1996457344 hasConceptScore W1996457344C159985019 @default.
• W1996457344 hasConceptScore W1996457344C171250308 @default.
• W1996457344 hasConceptScore W1996457344C185544564 @default.
• W1996457344 hasConceptScore W1996457344C192562407 @default.
• W1996457344 hasConceptScore W1996457344C204223013 @default.
• W1996457344 hasConceptScore W1996457344C2776798109 @default.
• W1996457344 hasConceptScore W1996457344C2779227376 @default.
• W1996457344 hasConceptScore W1996457344C45206210 @default.
• W1996457344 hasConceptScore W1996457344C49040817 @default.
• W1996457344 hasConceptScore W1996457344C521977710 @default.
• W1996457344 hasConceptScore W1996457344C53524968 @default.
• W1996457344 hasConceptScore W1996457344C62520636 @default.
• W1996457344 hasConceptScore W1996457344C71039073 @default.
• W1996457344 hasConceptScore W1996457344C82706917 @default.
• W1996457344 hasIssue "26" @default.
• W1996457344 hasLocation W19964573441 @default.
• W1996457344 hasOpenAccess W1996457344 @default.
• W1996457344 hasPrimaryLocation W19964573441 @default.
• W1996457344 hasRelatedWork W1492344729 @default.
• W1996457344 hasRelatedWork W1970429514 @default.
• W1996457344 hasRelatedWork W2010582499 @default.
• W1996457344 hasRelatedWork W2037655177 @default.
• W1996457344 hasRelatedWork W2040707907 @default.
• W1996457344 hasRelatedWork W2062650133 @default.
• W1996457344 hasRelatedWork W2084216123 @default.
• W1996457344 hasRelatedWork W2099612599 @default.

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