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- W1996564554 abstract "Diffusion of germanium (Ge) and arsenic (As) has been investigated simultaneously using As-implanted Ge isotope superlattices. No transient enhanced diffusion of As that could have arisen by the implantation damage is observed. A quadratic dependence of the Ge self-diffusion on the carrier concentration due to the Fermi level effect is observed. A precise reproduction of the Ge and As diffusion profiles by a numerical simulator lets us conclude that doubly negatively charged vacancies are the dominant point defects responsible for more than 95% of the self-diffusion in intrinsic Ge and this fraction increases even further in n-type Ge." @default.
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- W1996564554 date "2008-11-10" @default.
- W1996564554 modified "2023-09-29" @default.
- W1996564554 title "Charge states of vacancies in germanium investigated by simultaneous observation of germanium self-diffusion and arsenic diffusion" @default.
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- W1996564554 doi "https://doi.org/10.1063/1.3025892" @default.
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