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• W1996574377 abstract "Direct current and radio frequency glow discharge plasmas are described in terms of their evolution, mechanism, spatial characteristics, and voltage-current relationship. The basic plasma processes such as excitation, ionization/dissociation and recombination are reviewed using examples of the chemically reactive H2 + O2/H2O and N2 + H2/NH3 plasmas. This is followed by a discussion of some of the heterogeneous processes occurring at the walls and substrates, namely film formation, etching, nitriding and analogous reactions." @default.
• W1996574377 created "2016-06-24" @default.
• W1996574377 creator A5018586080 @default.
• W1996574377 date "1987-05-01" @default.
• W1996574377 modified "2023-10-01" @default.
• W1996574377 title "Basic processes in glow discharge plasmas" @default.
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• W1996574377 doi "https://doi.org/10.1016/0168-583x(87)90467-8" @default.
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