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- W1996673423 abstract "In high purity Si generation images of dislocations, appearing as white lines, may be obtained in scanning microscopy by using an IR beam with suitable wavelength, with excitations involving prevalently the dislocation energy levels. Different contrasts are observed with broad area contacts or with point contacts localized in the dislocation etch-pit centre.Dans Silicium de haute purete on a obtenu des images de dislocations comme des lignes blanches par le moyen d'un microscope a balayage. On a utilise un faisceau IR de convenable longueur d'onde, par excitation concernant les niveaux des dislocations. On a remarque des differents con-trastes avec larges contacts ou avec contacts ponctuels places dans le centre du “etch-pit” des dislocations." @default.
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- W1996673423 date "1982-10-16" @default.
- W1996673423 modified "2023-09-25" @default.
- W1996673423 title "Generation and Recombination Images of Dislocations in Si by Scanning Microscopy" @default.
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- W1996673423 doi "https://doi.org/10.1002/pssa.2210730241" @default.
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