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- W1996675237 abstract "In this paper the furnace annealing effects on the titanium silicide formation over a range of temperatures are investigated using physical and chemical measurements. In particular the formation steps and the properties of the interface between TiSi <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> and Si have been characterized by mean of Transmission Electron Microscopy. The experiments have been performed with the final aim to obtain Schottky barrier diodes (SBDs) whose fabrication process is suitable for a production line." @default.
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- W1996675237 date "2010-10-01" @default.
- W1996675237 modified "2023-09-27" @default.
- W1996675237 title "Structural and chemical analysis of self-aligned titanium silicide formed by furnace annealing" @default.
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- W1996675237 doi "https://doi.org/10.1109/asdam.2010.5666357" @default.
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