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• W1997007044 abstract "A low-cost method for the fabrication of nanostencils is presented. Microstencils with 1–2-µm-wide patterns were fabricated by standard microelectromechanical systems (MEMS) processes. In order to avoid the use of highly expensive nanolithography tools, the size of microapertures in a stencil was reduced by the subsequent deposition method. The size of microapertures was reduced to the sub-micrometer scale by the additional deposition of SiO2. In this study, 500-nm-thick SiO2 layers were deposited by plasma enhanced chemical vapor deposition (PECVD) on the top surface and bottom surface of a stencil. Deposition on the bottom surface showed a greater size reduction than that on the top surface owing to the taper shape in the cross section of a stencil membrane. The size-reduction rates were 420 nm on the bottom surface, and 290 nm on the top surface when a 500-nm-thick SiO2 layer was deposited on a plane. Nanopattering test results using the fabricated nanostencil showed the feasibility of the proposed low-cost nanolithography. An aluminum layer (100 nm thick) was deposited through the nanostencil by e-beam evaporation. Nanoscale lines as small as 100 nm wide were successfully patterned." @default.
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• W1997007044 date "2008-06-20" @default.
• W1997007044 modified "2023-09-24" @default.
• W1997007044 title "Fabrication of Nanostencil by Size Reduction of Microaperture by Additional Deposition" @default.
• W1997007044 cites W1996097396 @default.
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• W1997007044 doi "https://doi.org/10.1143/jjap.47.5042" @default.
• W1997007044 hasPublicationYear "2008" @default.
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