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- W1997435341 abstract "The ozone etching of thin films of a commercial polystyrene–polyisoprene–polystyrene (PS–PI–PS) triblock copolymer (Vector 4111) was studied using atomic force microscopy (AFM) and ellipsometry. The major phase of the copolymer consists of PI (82 wt.%) and the copolymer forms a cylindrical structure upon annealing. Moderate ozone doses (1.4% wt/wt) were used to etch the copolymer. This revealed two stages of the ozonation: rapid etching of the PI fragments followed by slow compacting of the remaining PS cylinders. Under certain conditions ozone treatment results in the formation of nanosized grooves in a PS matrix which is suitable for lithographic processes." @default.
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- W1997435341 date "2004-08-01" @default.
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- W1997435341 title "Ozone etching of a highly asymmetric triblock copolymer with a majority polydiene component" @default.
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- W1997435341 doi "https://doi.org/10.1016/j.eurpolymj.2004.03.022" @default.
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