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- W1997842999 abstract "A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub-30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks." @default.
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- W1997842999 date "2008-08-25" @default.
- W1997842999 modified "2023-09-24" @default.
- W1997842999 title "Sub-30-nm patterning on quartz for imprint lithography templates" @default.
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- W1997842999 doi "https://doi.org/10.1063/1.2963982" @default.
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