Matches in SemOpenAlex for { <https://semopenalex.org/work/W1997863142> ?p ?o ?g. }
Showing items 1 to 93 of
93
with 100 items per page.
- W1997863142 endingPage "3816" @default.
- W1997863142 startingPage "3816" @default.
- W1997863142 abstract "In this work, the properties and chemical mechanical polishing (CMP) characteristics of thin films of a new low dielectric constant (low‐κ) oxide deposited using Flowfill chemical vapor deposition (CVD) technology are presented. This oxide film consists of silicon dioxide network with methyl groups incorporated and has a dielectric constant κ as low as ∼2.7. The film properties were studied using Fourier transform infrared spectroscopy (FTIR),spectroscopic ellipsometry, Rutherford backscattering, atomic force microscopy, and capacitance‐voltage measurements. The refractive index, as low as 1.38, was measured using spectroscopic ellipsometry. The surface was found to be more hydrophobic compared to conventional CVD oxide. The stretching mode of the Si‐O bond peak in the FTIR spectrum shifts to lower wavenumber, which corresponds to lower Si‐O bonding energy, with increase in the methyl concentration inside the film. The CMP removal rate decreases as the methyl concentration in the film increases. An atomically smooth surface with root mean square surface roughness <1 nm over an area 2 × 2 μm was obtained after CMP. Our results suggest that the incorporation of methyl groups results in a reduction in the CMP removal rate. We speculate that the diffusion of water into the film is probably the CMP removal rate‐limiting step. © 2000 The Electrochemical Society. All rights reserved." @default.
- W1997863142 created "2016-06-24" @default.
- W1997863142 creator A5011092277 @default.
- W1997863142 creator A5011934407 @default.
- W1997863142 creator A5027723091 @default.
- W1997863142 creator A5037087171 @default.
- W1997863142 creator A5055734764 @default.
- W1997863142 creator A5059651484 @default.
- W1997863142 creator A5075442119 @default.
- W1997863142 date "2000-01-01" @default.
- W1997863142 modified "2023-10-06" @default.
- W1997863142 title "Chemical Mechanical Polishing of Low Dielectric Constant Oxide Films Deposited Using Flowfill Chemical Vapor Deposition Technology" @default.
- W1997863142 doi "https://doi.org/10.1149/1.1393978" @default.
- W1997863142 hasPublicationYear "2000" @default.
- W1997863142 type Work @default.
- W1997863142 sameAs 1997863142 @default.
- W1997863142 citedByCount "14" @default.
- W1997863142 countsByYear W19978631422013 @default.
- W1997863142 countsByYear W19978631422014 @default.
- W1997863142 countsByYear W19978631422019 @default.
- W1997863142 crossrefType "journal-article" @default.
- W1997863142 hasAuthorship W1997863142A5011092277 @default.
- W1997863142 hasAuthorship W1997863142A5011934407 @default.
- W1997863142 hasAuthorship W1997863142A5027723091 @default.
- W1997863142 hasAuthorship W1997863142A5037087171 @default.
- W1997863142 hasAuthorship W1997863142A5055734764 @default.
- W1997863142 hasAuthorship W1997863142A5059651484 @default.
- W1997863142 hasAuthorship W1997863142A5075442119 @default.
- W1997863142 hasConcept C107365816 @default.
- W1997863142 hasConcept C113196181 @default.
- W1997863142 hasConcept C127413603 @default.
- W1997863142 hasConcept C133386390 @default.
- W1997863142 hasConcept C138113353 @default.
- W1997863142 hasConcept C159985019 @default.
- W1997863142 hasConcept C160892712 @default.
- W1997863142 hasConcept C171250308 @default.
- W1997863142 hasConcept C178790620 @default.
- W1997863142 hasConcept C180088628 @default.
- W1997863142 hasConcept C18293161 @default.
- W1997863142 hasConcept C185592680 @default.
- W1997863142 hasConcept C19067145 @default.
- W1997863142 hasConcept C191897082 @default.
- W1997863142 hasConcept C192562407 @default.
- W1997863142 hasConcept C2777431650 @default.
- W1997863142 hasConcept C2779105228 @default.
- W1997863142 hasConcept C2779851234 @default.
- W1997863142 hasConcept C42360764 @default.
- W1997863142 hasConcept C49040817 @default.
- W1997863142 hasConcept C544956773 @default.
- W1997863142 hasConcept C57410435 @default.
- W1997863142 hasConceptScore W1997863142C107365816 @default.
- W1997863142 hasConceptScore W1997863142C113196181 @default.
- W1997863142 hasConceptScore W1997863142C127413603 @default.
- W1997863142 hasConceptScore W1997863142C133386390 @default.
- W1997863142 hasConceptScore W1997863142C138113353 @default.
- W1997863142 hasConceptScore W1997863142C159985019 @default.
- W1997863142 hasConceptScore W1997863142C160892712 @default.
- W1997863142 hasConceptScore W1997863142C171250308 @default.
- W1997863142 hasConceptScore W1997863142C178790620 @default.
- W1997863142 hasConceptScore W1997863142C180088628 @default.
- W1997863142 hasConceptScore W1997863142C18293161 @default.
- W1997863142 hasConceptScore W1997863142C185592680 @default.
- W1997863142 hasConceptScore W1997863142C19067145 @default.
- W1997863142 hasConceptScore W1997863142C191897082 @default.
- W1997863142 hasConceptScore W1997863142C192562407 @default.
- W1997863142 hasConceptScore W1997863142C2777431650 @default.
- W1997863142 hasConceptScore W1997863142C2779105228 @default.
- W1997863142 hasConceptScore W1997863142C2779851234 @default.
- W1997863142 hasConceptScore W1997863142C42360764 @default.
- W1997863142 hasConceptScore W1997863142C49040817 @default.
- W1997863142 hasConceptScore W1997863142C544956773 @default.
- W1997863142 hasConceptScore W1997863142C57410435 @default.
- W1997863142 hasIssue "10" @default.
- W1997863142 hasLocation W19978631421 @default.
- W1997863142 hasOpenAccess W1997863142 @default.
- W1997863142 hasPrimaryLocation W19978631421 @default.
- W1997863142 hasRelatedWork W1481257890 @default.
- W1997863142 hasRelatedWork W1653144682 @default.
- W1997863142 hasRelatedWork W1983603153 @default.
- W1997863142 hasRelatedWork W1999768459 @default.
- W1997863142 hasRelatedWork W2130148791 @default.
- W1997863142 hasRelatedWork W2154293465 @default.
- W1997863142 hasRelatedWork W2350003910 @default.
- W1997863142 hasRelatedWork W2378882722 @default.
- W1997863142 hasRelatedWork W2489206082 @default.
- W1997863142 hasRelatedWork W4246556003 @default.
- W1997863142 hasVolume "147" @default.
- W1997863142 isParatext "false" @default.
- W1997863142 isRetracted "false" @default.
- W1997863142 magId "1997863142" @default.
- W1997863142 workType "article" @default.