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- W1998049694 abstract "Conical holes bored in the active layer of a thin-film silicon solar cell by ion-beam lithography (IBL) show increase of effective optical absorption in the underlying silicon active layer. The optical properties are numerically simulated by the 3D finite-difference time-domain method (3D-FDTD), showing wideband increase of the UV, visible, and IR quantum efficiency. An experimental fabrication procedure is developed using IBL for high wide- area repeatability. A further optimization on the cone shapes is performed in order to make fabrication feasible with plasma etching techniques." @default.
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- W1998049694 date "2013-12-07" @default.
- W1998049694 modified "2023-09-23" @default.
- W1998049694 title "Ion-beam and plasma etching of a conical-pores photonic crystal for thin-film solar cell" @default.
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- W1998049694 doi "https://doi.org/10.1117/12.2033762" @default.
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