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- W1998196502 abstract "A simple kinetic model describing the molecular gas phase reactions during the formation of fumed silica (AEROSIL®) was developed. The focus was on the formation of molecular SiO2, starting from SiCl4, hydrogen and oxygen. Wherever available, kinetic and thermodynamic parameters were taken from the literature. All other parameters are based on quantum chemical calculations. From these data, an adiabatic model for the combustion reaction has been developed. It was found that a significant amount of molecular SiO2 forms after about 0.1 and 0.6 ms at starting temperatures between 1000 and 2000 K. The initial reaction of the SiCl4 combustion in a hydrogen/oxygen flame was found to be different from the combustion in air: The high reactivity of SiCl4 towards water is favored over the SiCl4 dissociation, which is the initial and rate-determining step during the combustion of SiCl4 in air. Die Verbrennung von SiCl4 in heissen O2/H2-Flammen Zur Beschreibung der molekularen Reaktionen in der Gasphase während der Herstellung von pyrogenem Siliciumoxid (AEROSIL®) wird ein einfaches kinetisches Modell entwickelt. Gegenstand der Arbeiten ist die Bildung von molekularem SiO2, ausgehend von SiCl4. Kinetische und thermodynamische Parameter, die in der Literatur nicht zur Verfügung stehen, werden mit Hilfe von quantenmechanischen Methoden berechnet. Im Rahmen eines adiabatischen Modells für die Verbrennungsreaktion wurde gefunden, dass bei Ausgangstemperaturen von 1000 bis 2000 K ein großer Teil an molekularem SiO2 gebildet wird. Die Startreaktion in der O2/H2-Flamme ist hierbei eine Reaktion von SiCl4 mit Wasser, anders als bei der Verbrennung von SiCl4 an Luft, bei der die Dissoziation von SiCl4 der erste und geschwindigkeitsbestimmende Schritt ist." @default.
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- W1998196502 date "2003-08-01" @default.
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- W1998196502 title "The Combustion of SiCl4 in Hot O2/H2 Flames" @default.
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- W1998196502 doi "https://doi.org/10.1002/zaac.200300053" @default.
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