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- W1998265004 abstract "We propose a process combining UV-assisted nanoimprint lithography (NIL) and shadow mask evaporation techniques to fabricate metallic nanoparticles with cavities. A bi-layer transparent soft stamp with a hard top layer containing the high resolution patterns was obtained by spin coating and casting methods of PDMS. Then, it was used to mold the top photo-curable resist on a thick PMMA layer. After removal of the residual NIL resist layer, high density and high aspect ratio PMMA nanopillar arrays were obtained by reactive ion etching. Afterward, a four step evaporation under oblique angle was performed to deposit the gold nanostructures at the top of nanopillars. After lift-off, uniformly sized gold nanocavities were collected. Dark-field microscopy imaging of the fabricated nanocavities shows a clear geometry dependence of the emission peak wavelength, thereby providing a novel types of bio-sensing nano-objects." @default.
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- W1998265004 date "2009-04-01" @default.
- W1998265004 modified "2023-09-23" @default.
- W1998265004 title "Fabrication of metallic nanocavities by soft UV nanoimprint lithography" @default.
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- W1998265004 doi "https://doi.org/10.1016/j.mee.2008.11.052" @default.
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