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- W1998401363 abstract "In response to the needs of the emerging field of normal incidence soft x-ray optics, a field with applications ranging from extreme ultraviolet (XUV) solar imaging to x-ray lithography, the National Institute of Standards and Technology (NIST) has initiated an XUV multilayer and optical substrate characterization program. In this paper, we give an overview of the present capabilities of the NIST facility and discuss some of the proposed improvements, concentrating on the new soft x-ray reflectometry facility being built at SURF." @default.
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- W1998401363 date "1992-01-01" @default.
- W1998401363 modified "2023-09-23" @default.
- W1998401363 title "<title>Upgraded facility for multilayer mirror characterization at NIST</title>" @default.
- W1998401363 doi "https://doi.org/10.1117/12.51284" @default.
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