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Matches in SemOpenAlex for { <https://semopenalex.org/work/W1998554920> ?p ?o ?g. }

• W1998554920 endingPage "29" @default.
• W1998554920 startingPage "24" @default.
• W1998554920 abstract "Abstract In situ internal stress measurements were used to investigate the influence of the chemical properties of the substrate on the growth of a titanium film deposited under UHV conditions. The substrate films used were titanium films evaporated at different water partial pressures. When the titanium film is evaporated at substrate temperatures of 130 °C and higher the shape of the stress vs thickness curve is interpreted to indicate island growth. Comparing the internal stress curve of titanium on Al2O3 and Ti/H2O substrates it is seen that the initial tensile stress is significantly larger on the Ti/H2O substrate film. This larger tensile stress is interpreted to originate from a redistribution of oxygen at the substrate interface during the early growth stage of the clean titanium film. A compressive stress contribution at higher thickness of the titanium film is interpreted to be due to hydrogen interdiffusion from the substrate into the titanium film. Annealing of the Ti/H2O substrate films at 350 °C for 20 min reduces the concentration of the surface oxygen species and the amount of hydrogen incorporated in the films. Dosing of previously annealed Ti/H2O substrate films with water affects both the oxygen concentration on the surface of these substrate films and the amount of hydrogen incorporated in the films. Oxygen dosing of these films only increases the concentration of the oxygen species on the substrate surface; thus only the initial tensile stress built up in the titanium film is affected. Dosing the films with hydrogen, on the other hand, only increases the amount of hydrogen incorporated in the substrate film, which by way of interdiffusion into the growing titanium film gives rise to a larger compressive stress at higher film thickness" @default.
• W1998554920 created "2016-06-24" @default.
• W1998554920 creator A5020779922 @default.
• W1998554920 creator A5077269367 @default.
• W1998554920 date "2003-06-01" @default.
• W1998554920 modified "2023-10-18" @default.
• W1998554920 title "Influence of substrate properties on the growth of titanium films: part IV" @default.
• W1998554920 cites W1967197423 @default.
• W1998554920 cites W1972074028 @default.
• W1998554920 cites W1977996268 @default.
• W1998554920 cites W1981023086 @default.
• W1998554920 cites W1981885798 @default.
• W1998554920 cites W1982181644 @default.
• W1998554920 cites W1989467782 @default.
• W1998554920 cites W1990860871 @default.
• W1998554920 cites W1990971461 @default.
• W1998554920 cites W2001675686 @default.
• W1998554920 cites W2004802131 @default.
• W1998554920 cites W2015805647 @default.
• W1998554920 cites W2016512560 @default.
• W1998554920 cites W2029187294 @default.
• W1998554920 cites W2041104540 @default.
• W1998554920 cites W2050970041 @default.
• W1998554920 cites W2060006096 @default.
• W1998554920 cites W2062222215 @default.
• W1998554920 cites W2088356160 @default.
• W1998554920 cites W2088753591 @default.
• W1998554920 cites W2089900332 @default.
• W1998554920 cites W2093870249 @default.
• W1998554920 cites W2094199107 @default.
• W1998554920 cites W2118548727 @default.
• W1998554920 cites W2128033418 @default.
• W1998554920 cites W2142429416 @default.
• W1998554920 cites W4230779194 @default.
• W1998554920 cites W4243091133 @default.
• W1998554920 cites W4255128100 @default.
• W1998554920 cites W2008903764 @default.
• W1998554920 doi "https://doi.org/10.1016/s0040-6090(03)00529-7" @default.
• W1998554920 hasPublicationYear "2003" @default.
• W1998554920 type Work @default.
• W1998554920 sameAs 1998554920 @default.
• W1998554920 citedByCount "9" @default.
• W1998554920 countsByYear W19985549202014 @default.
• W1998554920 countsByYear W19985549202022 @default.
• W1998554920 crossrefType "journal-article" @default.
• W1998554920 hasAuthorship W1998554920A5020779922 @default.
• W1998554920 hasAuthorship W1998554920A5077269367 @default.
• W1998554920 hasConcept C111368507 @default.
• W1998554920 hasConcept C127313418 @default.
• W1998554920 hasConcept C127413603 @default.
• W1998554920 hasConcept C185592680 @default.
• W1998554920 hasConcept C191897082 @default.
• W1998554920 hasConcept C192562407 @default.
• W1998554920 hasConcept C199289684 @default.
• W1998554920 hasConcept C2777289219 @default.
• W1998554920 hasConcept C42360764 @default.
• W1998554920 hasConcept C506065880 @default.
• W1998554920 hasConceptScore W1998554920C111368507 @default.
• W1998554920 hasConceptScore W1998554920C127313418 @default.
• W1998554920 hasConceptScore W1998554920C127413603 @default.
• W1998554920 hasConceptScore W1998554920C185592680 @default.
• W1998554920 hasConceptScore W1998554920C191897082 @default.
• W1998554920 hasConceptScore W1998554920C192562407 @default.
• W1998554920 hasConceptScore W1998554920C199289684 @default.
• W1998554920 hasConceptScore W1998554920C2777289219 @default.
• W1998554920 hasConceptScore W1998554920C42360764 @default.
• W1998554920 hasConceptScore W1998554920C506065880 @default.
• W1998554920 hasIssue "1-2" @default.
• W1998554920 hasLocation W19985549201 @default.
• W1998554920 hasOpenAccess W1998554920 @default.
• W1998554920 hasPrimaryLocation W19985549201 @default.
• W1998554920 hasRelatedWork W2022507789 @default.
• W1998554920 hasRelatedWork W2070338356 @default.
• W1998554920 hasRelatedWork W2313463498 @default.
• W1998554920 hasRelatedWork W2330498370 @default.
• W1998554920 hasRelatedWork W2748952813 @default.
• W1998554920 hasRelatedWork W2899084033 @default.
• W1998554920 hasRelatedWork W3046190049 @default.
• W1998554920 hasRelatedWork W3094131129 @default.
• W1998554920 hasRelatedWork W4231413117 @default.
• W1998554920 hasRelatedWork W4253328832 @default.
• W1998554920 hasVolume "434" @default.
• W1998554920 isParatext "false" @default.
• W1998554920 isRetracted "false" @default.
• W1998554920 magId "1998554920" @default.
• W1998554920 workType "article" @default.