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- W1998569146 abstract "Tin and lithium plasmas emit efficiently in the in-band region (13.5 nm with 2% bandwidth) necessary for extreme ultraviolet (EUV) lithography. We have made a detailed comparison of the atomic and ionic debris, as well as the emission features of Sn and Li plasmas under identical experimental conditions. Planar slabs of pure Sn and Li were irradiated with 1064 nm, 9 ns neodymium-doped yttrium aluminum garnet laser pulses for producing plasmas. A suite of diagnostics were used to analyze the emission and debris features, including optical emission spectroscopy (OES), a Faraday cup, an EUV pinhole camera, the absolute measurement of EUV conversion efficiency (CE), etc. Our results show that Sn plasmas provide a CE nearly twice that of Li. However, the kinetic energies of Sn ions are considerably higher, though with a lower flux. OES studies have showed that the kinetic energies of neutral species are substantially lower compared to that of the charged particle species." @default.
- W1998569146 created "2016-06-24" @default.
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- W1998569146 date "2010-09-15" @default.
- W1998569146 modified "2023-10-16" @default.
- W1998569146 title "Analysis of atomic and ion debris features of laser-produced Sn and Li plasmas" @default.
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- W1998569146 doi "https://doi.org/10.1063/1.3486209" @default.
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