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- W1998794908 abstract "In this study, a clean silicon surface is oxidized in a UHV chamber and the surface suboxide compositions are analyzed using in situ X-ray photoelectron spectroscopy. It is found that the predominant suboxides are Si 2 O 3 and SiO irrespective of crystallographic orientations in the early stages of oxidation. This is interpreted in terms of a significant number of atomic steps existing on the clean Si surface. The observed chemical shift of O(1s) core level signal is explained by the partial charge transfer from the first and second nearest-neighbor silicon atoms to oxygen." @default.
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- W1998794908 date "1988-11-01" @default.
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- W1998794908 title "Early Stage of Silicon Oxidation Studied by in situ X-Ray Photoelectron Spectroscopy" @default.
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- W1998794908 doi "https://doi.org/10.1143/jjap.27.l2213" @default.
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