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• W1999036605 abstract "The Tb40(Fe49Co49V2)60 films were fabricated by magnetron cosputtering from a multiple target arrangement at different argon pressures. The samples were investigated using X-ray diffraction, magnetic force microscope and vibrating sample magnetometer. A strong perpendicular anisotropy was obtained for the sample prepared at 0.4 Pa. The easy direction of magnetization could be turned from perpendicular to in-plane direction either at high working pressures (PAr>2.0 Pa) or by annealing at temperatures higher than 250 °C. An excellent magnetic softness with coercivity below 3 mT and saturating field of 20 mT in film-plane direction was obtained for the sample prepared at 0.7 Pa and then annealed at 350 °C." @default.
• W1999036605 created "2016-06-24" @default.
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• W1999036605 date "2012-05-01" @default.
• W1999036605 modified "2023-09-25" @default.
• W1999036605 title "Sputtering-pressure dependence of magnetic properties in amorphous Tb40(FeCoV)60 films" @default.
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• W1999036605 doi "https://doi.org/10.1016/s1002-0721(12)60069-6" @default.
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