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- W1999121189 abstract "The ablation of three polyethersulfone derivatives by excimer laser radiation at 308 nm and 248 nm was studied to determine the morphological modification of the polymer surface. Highly periodic micropatterns appeared on the surface of polyethersulfone and polyarylsulfone films ablated with a single laser beam at 308 nm in ambient air and in a vacuum, but a smooth surface remained in the case of polysulfone. The selection of radiative conditions, such as the fluence and the polarization of the ablating beam, allows the spacing and pattern of the microstructures to be modified. Topographical observation by scanning electron microscopy and analysis using a time-resolved light scattering technique were carried out to investigate the formation of the microstructure. These results indicate that the penetration depth of the ablating beam into the polymer film and the thermal processes of the surface during and after laser radiation play a significant role in the formation of the microstructures. The different micro-modifications of the three polymers can be explained in terms of the penetration of the beam and the rigidity of the polymers." @default.
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- W1999121189 date "1992-04-01" @default.
- W1999121189 modified "2023-10-01" @default.
- W1999121189 title "Excimer laser ablation of polyethersulfone derivatives: periodic morphological micro-modification on ablated surface" @default.
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- W1999121189 doi "https://doi.org/10.1016/1010-6030(92)85055-y" @default.
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