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- W1999211301 abstract "Ga implantation-induced intermixing is examined in terms of dose dependence and interdiffusion characteristics under conditions of dual implantation of As and Ga. At ion doses below 10 15 cm -2 , intermixing is mainly enhanced by the diffusion of defects. In the ion-dose region below 3×10 13 cm -2 , both implantation-induced damage and stoichiometric disturbances contribute to the formation of diffusing defects. The damage effect becomes dominant in the dose region around 10 14 cm -2 . In the dose region above 10 15 cm -2 , almost all interdiffusion is governed by atom coilision due to implantation." @default.
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- W1999211301 date "1989-02-01" @default.
- W1999211301 modified "2023-10-17" @default.
- W1999211301 title "Mechanism of Ga Implantation-Induced Intermixing of GaAs-AlGaAs Material" @default.
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- W1999211301 doi "https://doi.org/10.1143/jjap.28.l162" @default.
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