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- W1999387788 abstract "We report on the dynamics of in situ etching of nanowires using an etching agent which allows for parameter optimization for nanowire synthesis without concerns of tapering issues. Upon etching of InP nanowires using HCl it is found that HCl mainly reacts with the precursor TMI, its decomposition species, and physisorbed In. The reaction with solid InP is less rapid and diffusion limited. We find a gas-phase etch process which is metal assisted and has a high aspect ratio of 1:100." @default.
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- W1999387788 date "2011-01-01" @default.
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- W1999387788 title "Dynamics of extremely anisotropic etching of InP nanowires by HCl" @default.
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- W1999387788 doi "https://doi.org/10.1016/j.cplett.2010.12.061" @default.
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