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• W1999454158 abstract "Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings." @default.
• W1999454158 created "2016-06-24" @default.
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• W1999454158 date "2011-02-01" @default.
• W1999454158 modified "2023-09-27" @default.
• W1999454158 title "Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage" @default.
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• W1999454158 doi "https://doi.org/10.4028/www.scientific.net/amr.189-193.668" @default.
• W1999454158 hasPublicationYear "2011" @default.
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