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• W1999487876 abstract "Rhombohedral (rh-In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> ) In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> thin films were synthesized by Oxygen plasma process of RF sputtered In metal film. The formation of (110) oriented rh-In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> was confirmed by XRD analysis and well matched with JCPDS File no. 73-1809. The effect of process parameters on the growth of rh-In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> thin film and their optical properties was studied. The observed band gap was in between 2.45 and 2.92 eV. High process power and high gas flow rate affect the growth of rh-In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> and its band gap considerably. FTIR spectra analysis was performed to confirm the synthesis of rh-In <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> processed by O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> plasma. The elemental composition of processed films was studied by EDAX spectra." @default.
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• W1999487876 date "2012-09-01" @default.
• W1999487876 modified "2023-09-26" @default.
• W1999487876 title "Rhombohedral In<inf>2</inf>O<inf>3</inf> thin films preparation from in metal film using Oxygen plasma" @default.
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• W1999487876 doi "https://doi.org/10.1109/smelec.2012.6417242" @default.
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