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- W1999566029 abstract "The composition profile and the chemical states of ZnO films deposited on InP(100) were investigated by complementary chemical characterization techniques (namely, Rutherford backscattering spectroscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy). To obtain oxygen-stoichiometric films, ZnO films were prepared on InP(100) by means of pulsed laser deposition using a two-stage oxygen-pressure procedure. Such a procedure, which consists in an initial growth stage where the growth of the first monolayers takes place at oxygen pressures as low as 10-5 mbar followed by a stationary growth stage at higher oxygen pressure (10-1 mbar), is revealed as suitable to keep the oxygen composition without deteriorating the crystalline quality of the ZnO films nor degrading the substrate surface. The influence of the oxygen pressure used during the stationary growth stage on the optical properties in the visible wavelength range of the deposited films is examined by specular reflectance spectroscopy. Controlling the oxygen composition makes the system ZnO/InP(100) a promising candidate for the implementation of integrated short-wavelength photonic devices." @default.
- W1999566029 created "2016-06-24" @default.
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- W1999566029 date "2007-02-03" @default.
- W1999566029 modified "2023-09-24" @default.
- W1999566029 title "Chemical Characterization of ZnO Films Pulsed Laser Deposited on InP" @default.
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- W1999566029 doi "https://doi.org/10.1021/jp0662294" @default.
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