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• W1999782459 abstract "Diffraction anomalous fine structure on both Fe and Co K edges and transmission electron microscopy are used to study the crystallographic structure and morphology of thin ternary silicides films grown on Si(1 1 1). Co 1-x Fe x Si 2 layers (about 10 nm thick) have been grown by UHV-MBE in epitaxy on silicon. On either oriented or slightly mis-oriented (1 1 1) surfaces, and in situ annealed at about 925 K. In the Fe-rich part of composition, annealing at 925 K results in a phase separation into grains of two different structures, namely a CaF 2 -type (as CoSi 2 ) and α-FeSi 2 -type structures. In contrast, for Si surfaces with a very low miscut and in the Co-rich part of composition, annealing at 925 K results in an almost single phase with a CaF 2 -type structure. Transmission electron microscopy images show that, even in the Co-rich part, the stress gradient generated at the step edges acts as a nucleation centre for the α-FeSi 2 phase, which is thus probably more stable than the CaF 2 -type phase, stabilised by the stress on the terraces." @default.
• W1999782459 created "2016-06-24" @default.
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• W1999782459 date "2002-03-01" @default.
• W1999782459 modified "2023-10-18" @default.
• W1999782459 title "Epitaxy stabilised CaF2-type ternary Co1−xFexSi2 silicides on Si(1 1 1): DAFS and HRTEM measurements" @default.
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• W1999782459 doi "https://doi.org/10.1016/s0169-4332(01)00724-3" @default.
• W1999782459 hasPublicationYear "2002" @default.
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