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• W1999857549 abstract "The sequential deposition of two metals Me′ (Me′ = Ag) and Me″ (Me″ = Ag) and Me″ (Me″ = Pb or Tl) on poly- and single-crystal gold substrates was studied using the dipping technique and potential sweep voltammetry. In a first step, silver was deposited in submono-, mono-, or multilayer amounts under extreme diffusion controlled conditions at fixed under- and overpotentials. Using ex situ STM measurements, these thin silver films were found to be very regular even on an atomic scale, with a structure identical to that of the underlying gold substrate. In a second step, the deposition of Me″ was performed cyclic-voltammetrically in the corresponding underpotential region. From the peak structure of the Me″ desorption voltammogram it can be concluded that the Ag film is epitaxially deposited. After the deposition of 2–3 silver monolayers the gold single crystal substrate is totally transformed into a silver single-crystal substrate. At lower degrees of silver coverage the Me″ voltammograms exhibit contributions which are typical of both gold and silver substrates. If the sequential order of deposition of both metals is reversed, which means the silver is plated subsequent to the formation of a monolayer of Me″ adatoms, the desorption spectra exhibit a structure which is typical of the upd of Me″ on a Ag substrate, which means that the Ag atoms must have penetrated the Me″ layer." @default.
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• W1999857549 date "1992-09-01" @default.
• W1999857549 modified "2023-10-18" @default.
• W1999857549 title "Top-on-top monolayer formation of foreign metals on gold single crystal surfaces" @default.
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• W1999857549 doi "https://doi.org/10.1016/0013-4686(92)85117-4" @default.
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