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• W2000200402 abstract "Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450:1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos." @default.
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• W2000200402 date "2010-09-01" @default.
• W2000200402 modified "2023-10-14" @default.
• W2000200402 title "Passivation of aluminum with alkyl phosphonic acids for biochip applications" @default.
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• W2000200402 doi "https://doi.org/10.1016/j.apsusc.2010.05.041" @default.
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