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- W2000207337 abstract "Development-free vapor photolithography (DFVP) is a new technology, which is based on the reaction of SiO2 with HF vapor under a polymer film in the presence of accelerators. This paper discusses the effect of functional groups of polymers, glass transition temperature (Tg), film thickness, and etching temperature on the reaction. The results demonstrate that polymers with carbonyl, nitro, amino, amino formacyl, and other polar functional groups act not only as film formers but also as accelerators of the etching reaction of SiO2 with HF." @default.
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- W2000207337 date "1994-05-01" @default.
- W2000207337 modified "2023-10-18" @default.
- W2000207337 title "Effect of polymer accelerators upon development-free vapor photolithography" @default.
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- W2000207337 doi "https://doi.org/10.1016/0169-4332(94)90029-9" @default.
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