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- W2000214752 abstract "Abstract Structural heterogeneity in nitrogen-rich hydrogenated amorphous silicon nitride (a-SiNx:H) films prepared by a glow discharge has been investigated and discussed in relation to the breakdown electric field. By a small angle X-ray scattering measurement the films with a small √B-value have relative large sized heterogeneity probably due to the compositional fluctuation, while considerable NH2 bondings in the films are associated with small sized heterogeneity due to a shell structure consisting of NH2 and NH bondings. An excellent breakdown property is obtained for the films with low heterogeneity." @default.
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- W2000214752 date "1996-05-01" @default.
- W2000214752 modified "2023-09-27" @default.
- W2000214752 title "Structural heterogeneity in nitrogen-rich a-SiNx:H" @default.
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- W2000214752 doi "https://doi.org/10.1016/0022-3093(95)00644-3" @default.
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