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• W2000257777 endingPage "033013" @default.
• W2000257777 startingPage "033013" @default.
• W2000257777 abstract "Numerous studies report the importance of nanoscale metallic features to increase the sensitivity of gas sensors, biodetectors, and for the fabrication of the new-generation plasmonic devices. So far, nanoimprint lithography has not shown the capability to pattern a metallic structure that would both be sub-15 nm and sufficiently thick to ensure electrical conductance. To overcome these limitations, we report a step and repeat nanoimprint lithography (SR-NIL) on a pre-spin-coated layer stack. This work reports the fabrication of sub-15-nm lines that are 15-nm thick and have a 50-nm-half-pitch grating with 35-nm-thick metal, which represents the new state of the art for SR-NIL." @default.
• W2000257777 created "2016-06-24" @default.
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• W2000257777 date "2014-09-05" @default.
• W2000257777 modified "2023-10-18" @default.
• W2000257777 title "Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography" @default.
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• W2000257777 doi "https://doi.org/10.1117/1.jmm.13.3.033013" @default.
• W2000257777 hasPublicationYear "2014" @default.
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