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- W2000267719 abstract "Step and flash imprint lithography (SFIL) replicates patterns by using a transparent template with relief images etched into its surface. Recent work has examined alternative methods for template fabrication. One scheme incorporates a conductive and transparent layer of indium tin oxide (ITO) on the surface of the substrate. Features are defined on the templates by patterning a thin layer of PECVD oxide that is deposited on the ITO layer. A second method bypasses the oxide etch process by imaging a thin layer of hydrogen silsesquioxane (HSQ). By combining or iterating the two methods, it is possible to form multi-tiered structures on a template. Two and three tier structures were fabricated on silicon wafers and templates. A two layer structure was fabricated on a quartz photoplate by patterning PECVD oxide and subsequently patterning a second tier using HSQ. The resulting relief structures were successfully replicated on wafers using SFIL." @default.
- W2000267719 created "2016-06-24" @default.
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- W2000267719 date "2003-06-01" @default.
- W2000267719 modified "2023-10-11" @default.
- W2000267719 title "Fabrication of multi-tiered structures on step and flash imprint lithography templates" @default.
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- W2000267719 doi "https://doi.org/10.1016/s0167-9317(03)00075-3" @default.
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