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- W2000276833 abstract "Surface reconstructions of boron (B) on silicon (Si) have been well known for several years. One reconstruction of special interest to us is the so called 3 × 3 − R30° boron surface phase (BSP) on Si(111). This reconstruction can occur in two different forms, one with B located on T4 lattice sites (B-T4), the second one with B residing in S5 sites (B-S5) directly underneath a Si adatom in a T4 site. The two forms of the 3 × 3 − R30° reconstruction are expected to exhibit completely different properties due to their different chemical binding. In this paper we present work function measurements of these surface phases which clearly show their distinctively different behaviour and allow the determination of the temperature at which the boron atoms migrate from the T4 sites to the S5 sites. Furthermore, STM results concerning the overgrowth of BSPs with Si films of variable thicknesses and its effect on the BSP itself are shown." @default.
- W2000276833 created "2016-06-24" @default.
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- W2000276833 date "2000-12-01" @default.
- W2000276833 modified "2023-10-14" @default.
- W2000276833 title "Boron surface phase on Si(111): atomic structure and Si overgrowth studied by scanning tunneling microscopy and work function measurement" @default.
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- W2000276833 doi "https://doi.org/10.1016/s0040-6090(00)01464-4" @default.
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