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- W2000284025 abstract "Abstract Thin nanometre films of SiO2 on Si have been measured using a variety of IBA techniques. High-energy non-Rutherford backscattering and NRA were found to be the most suitable methods for relative thickness determinations, giving precisions to ∼1 nm, comparable to that obtained using ellipsometry. The information obtained is used to determine the oxygen areal density and bulk density of sol–gel films." @default.
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- W2000284025 date "2000-03-01" @default.
- W2000284025 modified "2023-10-10" @default.
- W2000284025 title "A comparative study of different IBA techniques for determining the thickness of thin SiO2 films" @default.
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- W2000284025 doi "https://doi.org/10.1016/s0168-583x(99)00944-1" @default.
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