Matches in SemOpenAlex for { <https://semopenalex.org/work/W2000295784> ?p ?o ?g. }
Showing items 1 to 68 of
68
with 100 items per page.
- W2000295784 abstract "Evaluation of the patterning accuracy of e-beam lithography machines requires a high precision inspection system that is capable of measuring the true xy-locations of fiducial marks generated by the e-beam machine under test. Fiducial marks are fabricated on a single photo mask over the entire working area in the form of equally spaced two-dimensional grids. In performing the evaluation, the principles of self-calibration enable to determine the deviations of fiducial marks from their nominal xy-locations precisely, not being affected by the motion errors of the inspection system itself. It is, however, the fact that only repeatable motion errors can be eliminated, while random motion errors encountered in probing the locations of fiducial marks are not removed. Even worse, a random error occurring from the measurement of a single mark propagates and affects in determining locations of other marks, which phenomenon in fact limits the ultimate calibration accuracy of e-beam machines. In this paper, we describe an uncertainty analysis that has been made to investigate how random errors affect the final result of self-calibration of e-beam machines when one uses an optical inspection system equipped with high-resolution microscope objectives and a precision xy-stages. The guide of uncertainty analysis recommended by the International Organization for Standardization is faithfully followed along with necessary sensitivity analysis. The uncertainty analysis reveals that among the dominant components of the patterning accuracy of e-beam lithography, the rotationally symmetrical component is most significantly affected by random errors, whose propagation becomes more severe in a cascading manner as the number of fiducial marks increases." @default.
- W2000295784 created "2016-06-24" @default.
- W2000295784 creator A5003891259 @default.
- W2000295784 creator A5037063679 @default.
- W2000295784 date "2003-08-26" @default.
- W2000295784 modified "2023-09-27" @default.
- W2000295784 title "Error propagation in calibration of e-beam lithography stages" @default.
- W2000295784 doi "https://doi.org/10.1117/12.504262" @default.
- W2000295784 hasPublicationYear "2003" @default.
- W2000295784 type Work @default.
- W2000295784 sameAs 2000295784 @default.
- W2000295784 citedByCount "1" @default.
- W2000295784 crossrefType "proceedings-article" @default.
- W2000295784 hasAuthorship W2000295784A5003891259 @default.
- W2000295784 hasAuthorship W2000295784A5037063679 @default.
- W2000295784 hasConcept C105795698 @default.
- W2000295784 hasConcept C111919701 @default.
- W2000295784 hasConcept C11413529 @default.
- W2000295784 hasConcept C120665830 @default.
- W2000295784 hasConcept C121332964 @default.
- W2000295784 hasConcept C123614077 @default.
- W2000295784 hasConcept C127413603 @default.
- W2000295784 hasConcept C137209882 @default.
- W2000295784 hasConcept C165838908 @default.
- W2000295784 hasConcept C168834538 @default.
- W2000295784 hasConcept C173974348 @default.
- W2000295784 hasConcept C188087704 @default.
- W2000295784 hasConcept C204223013 @default.
- W2000295784 hasConcept C21200559 @default.
- W2000295784 hasConcept C24326235 @default.
- W2000295784 hasConcept C31972630 @default.
- W2000295784 hasConcept C33923547 @default.
- W2000295784 hasConcept C41008148 @default.
- W2000295784 hasConceptScore W2000295784C105795698 @default.
- W2000295784 hasConceptScore W2000295784C111919701 @default.
- W2000295784 hasConceptScore W2000295784C11413529 @default.
- W2000295784 hasConceptScore W2000295784C120665830 @default.
- W2000295784 hasConceptScore W2000295784C121332964 @default.
- W2000295784 hasConceptScore W2000295784C123614077 @default.
- W2000295784 hasConceptScore W2000295784C127413603 @default.
- W2000295784 hasConceptScore W2000295784C137209882 @default.
- W2000295784 hasConceptScore W2000295784C165838908 @default.
- W2000295784 hasConceptScore W2000295784C168834538 @default.
- W2000295784 hasConceptScore W2000295784C173974348 @default.
- W2000295784 hasConceptScore W2000295784C188087704 @default.
- W2000295784 hasConceptScore W2000295784C204223013 @default.
- W2000295784 hasConceptScore W2000295784C21200559 @default.
- W2000295784 hasConceptScore W2000295784C24326235 @default.
- W2000295784 hasConceptScore W2000295784C31972630 @default.
- W2000295784 hasConceptScore W2000295784C33923547 @default.
- W2000295784 hasConceptScore W2000295784C41008148 @default.
- W2000295784 hasLocation W20002957841 @default.
- W2000295784 hasOpenAccess W2000295784 @default.
- W2000295784 hasPrimaryLocation W20002957841 @default.
- W2000295784 hasRelatedWork W1985342465 @default.
- W2000295784 hasRelatedWork W1992097434 @default.
- W2000295784 hasRelatedWork W2000295784 @default.
- W2000295784 hasRelatedWork W2061368612 @default.
- W2000295784 hasRelatedWork W2247457564 @default.
- W2000295784 hasRelatedWork W2899203397 @default.
- W2000295784 hasRelatedWork W3106293592 @default.
- W2000295784 hasRelatedWork W3139091477 @default.
- W2000295784 hasRelatedWork W4315648838 @default.
- W2000295784 hasRelatedWork W581140221 @default.
- W2000295784 isParatext "false" @default.
- W2000295784 isRetracted "false" @default.
- W2000295784 magId "2000295784" @default.
- W2000295784 workType "article" @default.