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- W2000308788 abstract "Methods for determining the doping profile from the semiconductor surface to the deep bulk using the high frequency CV technique are presented. The analysis includes: (i) surface analysis using an improved Ziegler's method, (ii) depletion region with the surface state detection, and (iii) deep depletion region with the minority carrier generation correction. Experimental data shows precise bulk doping concentration can be obtained despite significant minority carrier generation." @default.
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- W2000308788 date "1983-04-01" @default.
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- W2000308788 title "The complete doping profile using MOS CV technique" @default.
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- W2000308788 doi "https://doi.org/10.1016/0038-1101(83)90134-x" @default.
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