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• W2000326211 abstract "Unique capabilities of the scanning atom probe, atomically high resolution and atom-by-atom mass analysis, were utilized to investigate the compositional distribution in the individual apexes of a silicon microtip array and fine grains of chemical vapor deposition diamonds. The dry-etched silicon tips contain a large amount of carbon and hydrogen and the HF-treated tips contain even oxygen and fluorine. Although the carbon concentration of the uppermost surface layer is as high as 50% for the dry-etched tip, it decreases to less than 10% for the second layer and approaches to the constant concentration of less than 2% at the depth of 20 nm suggesting the carbon intermixture during the fabrication and/or etching process of the microtip array. The carbon concentration in the HF-treated tip decreases from 18% to 8% at the depth of 30 nm. On the other hand, the oxygen concentration stays fairly constant at around 25% throughout the analysis. The high hydrogen concentration in the diamonds is attributed to the large difference between the activation energies for hydrogen desorption, 21 kcal/mol, and for methane adsorption, 7.3 kcal/mol." @default.
• W2000326211 created "2016-06-24" @default.
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• W2000326211 date "1999-03-01" @default.
• W2000326211 modified "2023-10-18" @default.
• W2000326211 title "Atom-by-atom analysis of microtip emitter surfaces by the scanning atom probe" @default.
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• W2000326211 doi "https://doi.org/10.1116/1.590604" @default.
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