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- W2000346309 abstract "The Advanced Metrology Advisory Group (AMAG) is a council composed of the chief CD-metrologists from the International SEMATECH consortium's Member Companies and from the National Institute of Standards (NIST). The AMAG wrote, in 2002, with CD-SEM supplier involvement, updated the 'Unified Advanced CD-SEM Specification for Sub-130nm Technology (version 2002)' to be a living document which outlines the required performance of advanced CD-SEMs for supplier compliance to the 2001 International Technology Roadmap for Semiconductors, and also conveys other member companies' collective needs to vendors. Using this specification, a benchmarking effort of the currently available advanced CD-SEMs will be performed. As these results are not yet complete, they will be presented at a future date. However, the current version of the specification has undergone many changes and improvements from the last, and these will be discussed here." @default.
- W2000346309 created "2016-06-24" @default.
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- W2000346309 creator A5054479406 @default.
- W2000346309 date "2003-05-27" @default.
- W2000346309 modified "2023-09-26" @default.
- W2000346309 title "Cr and MoSi photomask plasma etching" @default.
- W2000346309 doi "https://doi.org/10.1117/12.483666" @default.
- W2000346309 hasPublicationYear "2003" @default.
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