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- W2000347027 abstract "TiO<SUB>2</SUB> thin films of different thicknesses were prepared by conventional electron beam deposition (EBD) and reactive low-voltage ion-plating (RLVIP) techniques. These samples were designed to investigate the thickness dependent optical and thermal properties of the TiO<SUB>2</SUB> coatings and the corresponding damage thresholds. In this paper we present a detailed comparison of the two groups of samples by using various photothermal techniques. The data reported include thermal conductivity, defect density, optical absorption, laser damage threshold, as well as laser conditioning effect by using Ar<SUP>+</SUP> laser irradiation. The general trend shown by the data is that the ion-plated samples have higher absorption, lower damage threshold, yet better thermal conductivity, lower defect density, and almost perfect stability under Ar<SUP>+</SUP> laser irradiation." @default.
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- W2000347027 date "1993-06-24" @default.
- W2000347027 modified "2023-09-27" @default.
- W2000347027 title "Photothermal comparison of reactive low-voltage ion-plated and electron-beam-deposited TiO 2 thin films" @default.
- W2000347027 doi "https://doi.org/10.1117/12.147428" @default.
- W2000347027 hasPublicationYear "1993" @default.
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