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- W2000371318 abstract "High-quality amorphous silicon germanium (a-SiGe:H) films are produced by a new ‘‘catalytic chemical vapor deposition (CTL CVD)’’ method. In the method, a SiH4, GeH4, and H2 gas mixture is decomposed without using any plasmas or photochemical excitation, but using only the thermal or the catalytic reaction with a heated tungsten catalyzer. Photoconductive properties of CTL CVD a-SiGe:H are apparently not degraded as the Ge content increases. The photoconductivity and the photosensitivity for AM-1 of 100 mW/cm2 are 10−5–10−4 (Ω cm)−1 and 104, respectively, even for the sample of optical band gap of 1.40–1.45 eV." @default.
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- W2000371318 date "1987-09-14" @default.
- W2000371318 modified "2023-10-12" @default.
- W2000371318 title "High-quality amorphous silicon germanium produced by catalytic chemical vapor deposition" @default.
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- W2000371318 doi "https://doi.org/10.1063/1.98871" @default.
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