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- W2000380471 abstract "In this paper, we propose a new model for alloying effects on electromigration in thin conductor lines. The mechanism considered is the action of material sinks and sources, modeled as a dislocation climb process. Mathematical expressions for the drift velocity and the stress evolution are derived and compared with experimental results on “Blech structures.” The agreement suggests that alloying elements may affect the electromigration behavior through their influence on dislocation mobility." @default.
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- W2000380471 date "1998-01-01" @default.
- W2000380471 modified "2023-09-26" @default.
- W2000380471 title "Alloying effects in electromigration: Modeling and experiments" @default.
- W2000380471 doi "https://doi.org/10.1063/1.54636" @default.
- W2000380471 hasPublicationYear "1998" @default.
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