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• W2000417462 abstract "A tunable membrane-type thin film bulk acoustic wave resonator (TFBAR) based on a Ba <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>0.3</sub> Sr <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>0.7</sub> TiO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> (BST) thin film has been fabricated. The resonance and antiresonance frequencies of the device can be altered by applying a dc bias: both shift down with increasing dc electric field. The resonance and antiresonance frequencies showed a tuning of -2.4% and -0.6%, respectively, at a maximum dc electric field of 615 kV/cm. The electromechanical coupling factor of the device increased up to 4.4%. We demonstrate that the tuning of the TFBAR is nonhysteretic. The Q-factor of the device showed some variation with dc bias and is about 200. The tuning of the TFBAR is caused by the dc bias dependence of the sound velocity and the intrinsic electromechanical coupling factor of the BST layer. We apply our recently developed theory on the electrical tuning of dc bias induced acoustic resonances in paraelectric thin films to successfully model the tuning behavior of the TFBAR. The modeling enabled us to de-embed the intrinsic electromechanical properties of the BST thin film. We show that the mechanical load of our device does not significantly degrade the tuning performance of the BST layer. The performance of the TFBAR is compared with the available data on varactor tuned TFBARs." @default.
• W2000417462 created "2016-06-24" @default.
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• W2000417462 date "2010-02-01" @default.
• W2000417462 modified "2023-10-01" @default.
• W2000417462 title "Tunable thin film bulk acoustic wave resonator based on Ba_xSr_1-xTiO₃ thin film" @default.
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• W2000417462 doi "https://doi.org/10.1109/tuffc.2010.1417" @default.
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