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- W2000428199 abstract "The hot carrier reliability characteristics of a bend-gate MOSFET have been extensively investigated. Compared with the conventional device structure, the bend-gate nMOSFET shows a shorter device lifetime for both maximum substrate current and high gate bias conditions. From the impact ionization rate (Isub/Id) versus gate-voltage characteristics, the enhanced degradation of the bend-gate MOSFET can be explained by the current crowding effect at the drain corner." @default.
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- W2000428199 date "2000-06-01" @default.
- W2000428199 modified "2023-10-02" @default.
- W2000428199 title "Hot carrier reliability characteristics of a bend-gate MOSFET" @default.
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- W2000428199 doi "https://doi.org/10.1016/s0038-1101(00)00004-6" @default.
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