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- W2000448450 abstract "The electron-stimulated sputtering of thin amorphous solid water films deposited on Pt(111) is investigated. The sputtering appears to be dominated by two processes: (1) electron-stimulated desorption of water molecules and (2) electron-stimulated reactions leading to the production of molecular hydrogen and molecular oxygen. The electron-stimulated desorption of water increases monotonically with increasing film thickness. In contrast, the total sputtering—which includes all electron-stimulated reaction channels—is maximized for films of intermediate thickness. The sputtering yield versus thickness indicates that erosion of the film occurs due to reactions at both the water/vacuum interface and the Pt/water interface. Experiments with layered films of D2O and H2O demonstrate significant loss of hydrogen due to reactions at the Pt/water interface. The electron-stimulated sputtering is independent of temperature below ∼80K and increases rapidly at higher temperatures." @default.
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- W2000448450 date "2005-08-01" @default.
- W2000448450 modified "2023-09-27" @default.
- W2000448450 title "Electron-stimulated sputtering of thin amorphous solid water films on Pt(111)" @default.
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- W2000448450 doi "https://doi.org/10.1063/1.1943388" @default.
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