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- W2000455460 abstract "The reaction between SiCl4 and O2 at 1 atm between 25 and 1200°C has been followed by mass spectrometry. Below 600°C no reaction with O2 is noted. Above 600°C the reaction proceeds in two steps. Between 800 and 1000°C the 28Si/32O2 peak height ratio is constant with no evolution of Cl2. It is suggested that silicon oxychlorides are being formed in this temperature regime. Above 1000°C the reaction between SiCl4 and O2 intensifies with concomitant production of Cl2. It is suggested that above 1000°C the reaction SiCl4 + O2 → SiO2 + Cl2 becomes important. At low temperatures (<800°C) adsorbed H2O and OH groups from the surface of the fused silica tube react with SiCl4 to form HCl. The importance of this reaction decreases with increasing temperature. The increased production of HCl above 1000°C is ascribed to H2O and H2 diffusing from the tube." @default.
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- W2000455460 date "1979-05-01" @default.
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- W2000455460 title "High temperature reaction of SiCl4 and O2 in quartz tubes" @default.
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- W2000455460 doi "https://doi.org/10.1016/0040-6031(79)85056-x" @default.
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