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• W2000482871 abstract "Abstract During the atomic layer deposition (ALD) of ZnO films on a bulk quantity of high surface area particles, the thermal decomposition of diethlyzinc (DEZ) is problematic at normal operating temperatures. A low-temperature pathway to ZnO ALD on bulk quantities of nanoparticles was studied using concentrated H2O2 as the oxidant in a fluidized bed reactor. Decreasing the operating temperature effectively mitigated DEZ decomposition, but caused liquid bridging of particles. The mechanisms behind the non-ideal behaviors associated with high temperature precursor decomposition and low-temperature liquid bridging are discussed. An optimal deposition temperature was observed at 100 °C to balance these effects." @default.
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• W2000482871 date "2008-10-01" @default.
• W2000482871 modified "2023-10-02" @default.
• W2000482871 title "Low-temperature atomic layer deposition of ZnO films on particles in a fluidized bed reactor" @default.
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• W2000482871 doi "https://doi.org/10.1016/j.tsf.2008.05.026" @default.
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