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- W2000483205 abstract "Ultraviolet laser photolysis of methyl-halides has been used to produce localized photoetching of GaAs and InP. A spatial resolution of ≃1μm has been achieved and an etch rate ≳104 times that of the dark reaction demonstrated. A chemical mechanism is proposed and the observed resolution is explained by a simple physical model." @default.
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- W2000483205 date "1980-04-15" @default.
- W2000483205 modified "2023-10-16" @default.
- W2000483205 title "Laser‐induced microscopic etching of GaAs and InP" @default.
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- W2000483205 doi "https://doi.org/10.1063/1.91597" @default.
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