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- W2000491638 abstract "Oxygen outdiffusion from Czochralski silicon has been studied under various atmospheres, such as oxygen, nitrogen, and argon/hydrogen (10%). The enhancement of the oxygen diffusion coefficient by hydrogen has been confirmed. Besides, thermal treatments in a halogen lamp furnace has led to a 100-fold higher oxygen diffusion coefficient under a neutral atmosphere, and to a 1000-fold enhancement under a hydrogenated atmosphere. Moreover, in this latter case, a level at 6.5×1017 atoms cm−3 in the oxygen profile has been observed at the surface of the sample. Electron-hole pair generation under intense ultraviolet radiation eventually combined with the presence of hydrogen is likely responsible for the anomalously high oxygen diffusion during rapid thermal processing." @default.
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- W2000491638 date "1993-11-15" @default.
- W2000491638 modified "2023-10-10" @default.
- W2000491638 title "Charged particle activation analysis study of the oxygen outdiffusion from Czochralski-grown silicon during classical and rapid thermal annealing in various gas ambient" @default.
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- W2000491638 doi "https://doi.org/10.1063/1.355174" @default.
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