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• W2000496650 abstract "A reactive magnetron sputtering deposition technique was used for the deposition of a-C:H/Me coatings on different substrates under various deposition conditions. Several metal targets, including Al, Si, Fe, Ni, Cu, and Pt, were used. Depending on the growth condition, metal type, and substrate material, the obtained a-C:H/Me coatings were found to exhibit various microstructures. The conditions that favor the formation of alternating nanolayer structure are studied and determined; therefore a processing window was obtained." @default.
• W2000496650 created "2016-06-24" @default.
• W2000496650 creator A5022751447 @default.
• W2000496650 creator A5081473847 @default.
• W2000496650 date "2013-09-01" @default.
• W2000496650 modified "2023-09-27" @default.
• W2000496650 title "Reactive sputter deposition of metal containing hydrogenated amorphous carbon coatings exhibiting self-assembled alternating nanolayers" @default.
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• W2000496650 doi "https://doi.org/10.1016/j.surfcoat.2012.04.089" @default.
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