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• W2000506393 abstract "High hole concentration was achieved in Mg-doped AlxGa1−xN (x ∼ 0.4) by using indium-surfactant-assisted delta doping method. A maximum carrier concentration of 4.75 × 1018 cm−3 was obtained, which is three times higher than that of the conventionally delta-doped sample. Sheet resistivity as low as 2.46 × 104 Ω/sq was realized, benefiting from the high hole concentration (p). Analysis results show that the Mg incorporation is effectively enhanced, while the compensation ratio and acceptor activation energy (EA) are significantly reduced by using In surfactant. It was also found that the In surfactant may induce stronger valence-band modulation, contributing to the decrease of EA and the increase of p." @default.
• W2000506393 created "2016-06-24" @default.
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• W2000506393 date "2015-04-20" @default.
• W2000506393 modified "2023-09-23" @default.
• W2000506393 title "High hole concentration in p-type AlGaN by indium-surfactant-assisted Mg-delta doping" @default.
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• W2000506393 doi "https://doi.org/10.1063/1.4919005" @default.
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