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- W2000520963 abstract "This paper is intended as investigations of two interesting characteristics of ArF immersion lithography using topcoat (TC). On the one hand, we identified several hundreds gel-type defects over large areas of the unexposed top surface of the resist in cases where a TC was used. On the other hand, we observed that the optical proximity effect (OPE) profiles in immersion lithography varied with the type of TC materials beyond expectation. The magnitude of OPE was reduced to approximately 20 nm in the region of maximum influence. We investigated the influences on these characteristics of the TC material and the methods of application (i.e. baking conditions and exposure). The chemical interaction (e.g., mixing) between the resist and the TC was examined by employing time-of-flight mass spectrometry with gradient shaving preparation (GSP + TOF) and FT-IR measurements and by focusing on the interface of the resist and TC. We confirmed consistent correlations between lithographic properties and chemical interaction. The TC material and process which form much mixing layer due to the chemical interaction tended to cause gel-type defect and variation of OPE profile." @default.
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- W2000520963 date "2006-01-01" @default.
- W2000520963 modified "2023-09-23" @default.
- W2000520963 title "Characteristics of ArF Immersion Lithography Using Topcoat" @default.
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- W2000520963 doi "https://doi.org/10.2494/photopolymer.19.547" @default.
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